Our LPCVD (low pressure chemical vapor deposition) system is designed to meet the high temperature requirements of graphene and CNT research. To meet these requirements Angstrom engineered a water cooled furnace that can reach 1100ºC yet cool down rapidly. Various chamber tube sizes are available between ø2in and ø8in allowing processing of single small samples up to batches of 6in wafers.
To meet the needs of the growing research market for carbon nanotubes, graphene and other 2D crystals Angstrom is offering a system which provides precise process control & process flexibility along with a history of considering user safety as paramount. A complete interlock system protects users from the extreme temperatures, process gases, and high voltages present in this type of equipment. In the event of a PC to PLC disconnect a heartbeat sensor will ensure the system is brought to a safe state.
The fully automated process control system allows users to build, store and execute complex recipes up to 50 steps using a 24in touch screen interface. Data logs are stored for each process and can be downloaded via a USB interface to be analyzed using your preferred office software.